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Nanotechnology of thin films.

Nanotechnology Nano lithography

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Satyadhar (Satyam Shivam Sundaram)
Page dedicated to Lord Shiv(The Greatest Physicist Engineer and Nano technologist )
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I an Under-Graduate student of engineering, I have done quite some work on Nanotechnology, took part in many competetions related to Nanotechnology, presented many research papers on Nanotechnology and have made this website as the biggest portal for nanotech downloads so that I can share about my work on Nanotechnology. What I believe is

Engineering + Physics + Shivbhakti = Good life

Site under intense development. 1000s of pdfs, more than 2 G.B. of free download on Nanotechnology. And the next big update will happen very soon.

This site contains free downloads,articles,reports on Nanotechnology nanotechnologie and introduction Nanotechnology about nanotechnology.


Innovations in the area of micro and nanofabrication have created opportunities to manufacture structures at the nanometer and milli- meter scales. These opportunities can be used to fabricate electronic, optical, magnetic, and chemical/biological devices ranging from sensors to computation and control systems. This site is about dominant micro and nanofabrication techniques that are currently used to fabricate structures in the nanometer scale up to the millimeter scale. This site focuses on microfabrication of MEMS and semiconductor devices as an example of microfabrication. Also the next part focuses on nanofabrication techniques including several top-down and bottom-up techniques. Again, we use semiconductor devices as an example that shows the promising techniques that can be used to manufacture nanofabricated structures.


Most micro and nanofabrication techniques were developed by the semiconductor industry. The semiconductor industry has grown rapidly in the past 30 years, which is driven by the microelectronics revolution. The desire to place many transistors on to a silicon wafer has demanded innovative ways to fabricate electronic cir- cuits and to fit more and more electronic devices into a smaller workable area. Early transistors were made from germanium but are now predominantly silicon, with the remainder made from gallium arsenide. While gallium arsenide has high electron mobility compared to silicon, it has low hole mobility, a poor thermal oxide, less stability during thermal processing, and much higher defect density than silicon. Silicon is the material of choice for most electronic application but gallium arsenide is useful for circuits that operate at high speeds with low-to-moderate levels of integration.



Nanofabrication Using Soft Lithography Nanofabrication has developed from a direct requirement to increase the density of transistors to a single piece of silicon. However, nano- fabrication can be used to develop products other than for the semi- conductor industry. In the first instance, nanofabrication is being developed to construct devices such as resonant tunneling diodes and transistors, and single-electron transistors and carbon nanotube transistors. The most common type of transistor being developed for use at the nanoscale is the field effect transistor.

A very simple and novel way of reproducing nanoscale features is to use a technique known as soft lithography. In soft lithography, a liquid known as polydimethylsiloxane is poured on a master pattern of the feature to be produced. The liquid cures to form a "rubbery" solid that can be peeled over the master pattern to reveal a very simple mold that can be attached to a stamp. In the self-assembly process, a stamp is coated with a solution of molecules known as thiols. Thiols then self-assemble on contact with a thin gold film that has been deposited to the silicon substrate.

Nanofabrication using manipulative techniques is a promising way of producing nano-based electronic components using processes such as scanning tunneling microscopy, atomic force microscopy, spin-polarized scanning tunneling microscopy, and dip pen nano- lithography.

Production og nanoparticles
Production methods for nanoparticles can be loosely classified into three general categories: wet synthesis, dry synthesis, and milling. In both wet and dry synthesis, nanoparticles are generally produced in a bottom-up way from atomic precursors, whereas in the milling approach, nanoparticles are produced from the top down by mechanically breaking down larger particles. Wet approaches include sol-gel and precipitation methods, whereas dry approaches encompass combustion, furnace, and plasma synthesis of nanoparticles.
In all cases, there are concerns about the narrowness of the size distribution of the nanoparticles, and concern about the degree of agglomeration. All processes for making nanoparticles lead to some spread in the particle size. The size distribution can be modified somewhat by adjusting the process parameters, or the size distribution can be tailored by removing the tails of the distribution through additional separation steps. This typically leads to lower process yield. With respect to agglomeration, nanoparticles have a high ratio of surface area to volume, and it is much more energetically favorable for them to reduce their surface area by coalescing together. Thus, materials that melt at high temperatures if they are in bulk form may fuse together at much lower temperatures if they are nanoparticles.
Some applications, such as the fluorescing quantum dots mentioned earlier, have very tight requirements for particle size and aggregation. Other applications, such as CMP slurries, may not have such narrow constraints. There is no one perfect process. Milling is very energy-intensive, and it may not work at all for some materials, such as pure metals, that are malleable. Precipitation methods may require the addition of capping ligands to the nanoparticle suspension, to stop particle growth and to prevent the particles from agglomerating together. These ligands bind to the surface of the particles, and if they do not impart the desired functionality to the particles, they must be displaced in a separate processing step.
In high-temperature synthesis of nanoparticles, agglomeration can be avoided for some materials by simultaneously quenching and diluting, but this presents a challenge when the process is scaled up. If the nanoparticles suspended in the gas are more dilute, more energy is required to recover them. For some materials that are viscous glasses at high temperature, such as silica, diluting and quenching may not help. Some processes, such as electro-spray or plasma-based syntheses, produce particles that are highly charged, and this aids in reducing agglomeration.


Carbon nanotube manufacturing
Carbon nanotube synthesis in recent years has been driven by yields and cost. To move nanotubes from scientific curiosity to practicality, they must be available in sufficient quantities at a reasonable cost with high uniformity and reproducibility. In the case of MWNTs, the arc-discharge method provides a good alternative, yielding large quantities of material at a good cost. In the case of SWNTs, while generating large quantities of material, the purity is often unacceptable for a subset of applications because of excessive carbonaceous contamination. Instead, the CVD method and a recent alternative, plasma-enhanced chemical vapor deposition (PECVD), have burst onto the scene as the methods of choice for producing large quantities of SWNTs with micron lengths, purity, and reliability within specifications for certain applications.




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About me
Activities and Honors
o First Prize in VLSI Quiz - OIST Bhopal. Bhopal, 2006. Won first prize in VLSI Quiz with over 600 participants.
o Business Plan competition - IIT Madras. Chennai, 2007. Won consolation prize in Bplan competition. Plan to Open Carbon Nanotube Manufacturing and MEMS consultancies. Made a software Nanowave (also uploaded on home page).

Publications
o "MEOMS micro mirrors." Proceedings of Eureka. IIT Kgp, February 2008, 4. Worked on many aspects of MEOMS
o "CNT Nanomanufacturing and Physics." Ideaz Paper presentation. Cognizance IIT Roorkee, March 2008. Paper on "CNT nanomanufacturing by CVD method and Physics of CNT"
o "MEMS Packaging and Design." Optima (techfest). IIT Kharagpur, March 2007. Paper on "MEMS Packaging and Design"

Training Certificates
o Theoretical Study on CNT - Centre for Advanced Technology Indore. CAT Indore, 2007. Worked and Studied CNT and MEMS (theoretical)
o NSTC Noida "Nanotechnology sensitization program". Project on Nanoelectronics submitted in 2006
o Course on Conventorware (MEMS design) - Coventorware MEMS design. BITS Pilani, 2007. 3 day course on MEMS Design on Coventorware

Workshops and Seminars
o Workshop on Nanotech Status and challenges - IIT Delhi. IIT Delhi, 2007. Attended workshop on Nanotechnology, had many lab visits
o Workshop on MEMS - Mech Engg IITB. IIT Bombay, 2007. Workshop organized by Radiance, dept of Mechanical Engineering.
o Workshop on CNT - IIT Madras, 2006 to 2006. Workshop on Nanotechnology and CNT, Fabrication of CNT and Physics of CNT




Nanotechnology of thin films.

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Molecular Self Assembly Nanotechnology




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